Austria – Laboratory, optical and precision equipment (excl. glasses) – JKU Linz: 02/2026 Electron-beam lithography device
Delivery and installation ready for acceptance of an electron-beam lithography device (including training) Delivery and installation ready for acceptance and commissioning of an electron-beam lithography system with at least 50 keV electrons
Opportunity description
Delivery and installation ready for acceptance of an electron-beam lithography device (including training) Delivery, installation ready for acceptance, and commissioning of an electron-beam lithography system with at least 50 keV electron energy and high writing speed, high resolution, and precise placement of structures, both in the 10 nm range (including training) Procedure: open. Review the original TED notice for the complete requirement, lots, amendments and attachments.
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