Germany – Laboratory, optical and precision equipment (excl. glasses) – ALD system
The Leibniz Institute of Photonic Technology e.V. is tendering a plasma-enhanced atomic layer deposition system (abbreviated: PE-ALD, engl. plasma enhanced atomic layer deposition) for thin-film deposition, which is to be used for the deposition of thi
Opportunity description
The Leibniz Institute of Photonic Technology e.V. is tendering a plasma-enhanced atomic layer deposition system (abbreviated: PE-ALD, engl. plasma enhanced atomic layer deposition) for thin-film deposition, which is to be used to deposit thin films on various substrates ranging from individual chip format (5 x 5 mm²) to wafers of at least 150 mm. The central requirements for the system are reproducible deposition processes for various conductive, semiconducting and dielectric layers. These are also to be processed without interruption of the vacuum (multilayers). A control PC with monitor, keyboard, mouse, corresponding software licenses and a current operating system (Win 11) must be supplied. Procedure: open. Estimated value: 461,344 EUR. Review the original TED notice for the complete requirement, lots, amendments and attachments.
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